作者: Jin-Woo Moon , Sang-Koo Chung
DOI: 10.5370/JEET.2011.6.6.824
关键词:
摘要: Transmission line analysis of the surface accumulation layer in injection-enhanced gate transistor (IEGT) is presented for first time, based on per-unit-length resistance and conductance beneath IEGT. Lateral electric field surface, as well electron current injected into layer, governed by well-known wave equation, decreases an exponential function lateral distance from cathode. Unit-length are expressed terms device parameters applied voltage. Results obtained experiments consistent with numerical simulations.