Transmission Line Analysis of Accumulation Layer in IEGT

作者: Jin-Woo Moon , Sang-Koo Chung

DOI: 10.5370/JEET.2011.6.6.824

关键词:

摘要: Transmission line analysis of the surface accumulation layer in injection-enhanced gate transistor (IEGT) is presented for first time, based on per-unit-length resistance and conductance beneath IEGT. Lateral electric field surface, as well electron current injected into layer, governed by well-known wave equation, decreases an exponential function lateral distance from cathode. Unit-length are expressed terms device parameters applied voltage. Results obtained experiments consistent with numerical simulations.

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