Semiconductor device with borderless contact structure and method of manufacturing the same
作者： Sung-un Kwean , Jae-seung Hwang
DOI:
关键词:
摘要: A semiconductor device comprising a borderless contract structure and method of manufacturing the same. An etch-protecting layer is formed on substrate having gate electrodes an active area substrate. Spacers are layer, removed after performing source/drain ion-implantation process to secure region for forming contact hole between electrodes. After sequentially etch-stopping insulating interlayer resultant structure, etched form first which exposes surface second adjacent field oxide portion layer.
lens.org 参考文章(18)
Corinne Buchet, Christophe Balsan, Stephane Thioliere, Patrick Raffin, Method of depositing a conformal hydrogen-rich silicon nitride layer onto a patterned structure ,(2001)
Krishna K. Parat, Glen N. Wada, Daniel N. Tang, Gregory E. Atwood, Self-aligned contact process in semiconductor fabrication and device therefrom ,(1997)
Woon-kyung Lee, Joon-Sung Lee, Nonvolatile semiconductor memory device with a multi-layer sidewall spacer structure and method for manufacturing the same ,(2001)
Bo-Un Yoon, Young-rae Park, Sang-rok Hah, Jung-yup Kim, Jeong-sic Jeon, Hong-kyu Hwang, Semiconductor device including gate electrode having damascene structure and method of fabricating the same ,(2001)
Hirofumi Watatani, Semiconductor device with both memories and logic circuits and its manufacture ,(2002)
Derryl J. Allman, Peter McGrath, Shiqun Gu, Method for preventing borderless contact to well leakage ,(2001)
Thomas W. Martin, Marcello D. Fiscella, William D. Goodwin, Method for minimizing curl of transparent media during printing of high density thermal dye transfer images ,(1991)
Takeshi Shinagawa, Seiichi Mori, Semiconductor device with an insulating film separating conductive layers and method of maufacturing semiconductor device ,(1990)
Daniel Kadosh, Mark I. Gardner, Frederick N. Hause, Method of forming a contact hole in an interlevel dielectric layer using dual etch stops ,(1997)
Chung-Hsien Wu, Yi-Min Jen, Method of forming a contact window ,(1998)