Film thickness measuring and film forming method

作者: Naoki Awaji , Satoshi Komiya , Shunji Kashiwagi

DOI:

关键词:

摘要: A film thickness measuring method comprises the steps of reflectances X-rays on a film, extracting interference oscillations from measured X-ray reflectances, and Fourier transforming to compute an average reflectance being given by fitting analysis formula including term product power function incident angle, which expresses attenuation smooth surface exponent influence roughness constant expressing background added product; using reflectance. The can extract curve arbitrariness simple procedure.

参考文章(2)
Shuji Okada, Hiro Matsuda, Masao Kato, Hachiro Nakanishi, Method using x-rays to determine thickness of organic films ,(1990)
Louis N. Koppel, X-ray thickness gauge ,(1996)