The Contribution of Electronic Processes in Sputtering

摘要: Many materials decompose when exposed to ionising radiation. For some, such as the alkali halides, threshold energy for defect formation is merely that exciton production. Because of long history studies in a detailed model has evolved generation and vacancy-interstitial separation. Key steps are diffusion, induced halogen relaxation replacement collision sequence. The successfully predicts sputtering material from surface with directionality yield, plus complex impurity, temperature, lifetime effects. Time flight measurements reveal component species energies up few eV. All these effects compatible basic model.