Interstitial Motion During Radiation Damage and Sputtering Processes
作者： F. Agullo-Lopez , P. D. Townsend
关键词: Detailed data 、 Low energy 、 Physical chemistry 、 Chemistry 、 Electron excitation 、 Radiation damage 、 Energy spectrum 、 Sputtering 、 Optics 、 Electronic, Optical and Magnetic Materials 、 Condensed matter physics
摘要: There are two major models for the mechanism of interstitial motion away from F centre during photon or low energy electron excitation alkali halides. Previously these a focussed replacement collision sequence halogen ions thermally activated H diffusion considered to be alternatives. Some new detailed data on ejection halides irradiation reported which relevant this problem. A model is presented offers an explanation ejection: spectrum, temperature dependence, and presence molecular emission. Experiments would further clarify proposed. Les deux principaux modeles pour decrire la interstitielle partir d'un F, dans des halogenures alcalins, pendant l'excitation par un ou de faible energie, sont d'une part une focalisee replacement, et d'autre thermique du H. De nouvelles donnees, applicables ce probleme, sur l'ejection d'halogene d'halogenures ont ete publiees. Nous presentons ici modele qui offre explication aux resultats obtenus au cours d'halogene: spectre d'energie, dependance en d'emission moleculaire. proposons aussi experiences pourraient ameliorer modele.
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