Gas-phase nucleation during the thermal decomposition of silane in hydrogen

摘要: Abstract Fine particles of silicon, 300 to 800 A in size, have been obtained by nucleation and postgrowth gas-phase during the thermal decomposition silane hydrogen. This phenomenon silicon was found occur at an input concentration exceeding 0.2 vol% 1100°C a conventional horizontal epitaxial reactor. The size shape structure investigated electron microscopy. were be single crystalline mostly defect free with three kinds crystal habits. Around 80% octahedral, followed about 10% tetrahedral smaller number truncated triangular bipyramidal ones. total amount converted has determined increase temperature growth process diffusion controlled.