作者: H. Sakaki , T. Noda , K. Hirakawa , M. Tanaka , T. Matsusue
DOI: 10.1063/1.98305
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摘要: We study experimentally and theoretically the influence of interface roughness on mobility two‐dimensional electrons in modulation‐doped AlAs/GaAs quantum wells. It is shown that scattering dominant mechanism thin wells with a well thickness Lw<60 A, where electron mobilities are proportional to L6w, reaching 2×103 cm2/V s at Lw∼55 A. From detailed comparison between theory experiment, it determined ‘‘GaAs‐on‐AlAs’’ grown by molecular beam epitaxy has height 3–5 A lateral size 50–70