Method for producing semiconductor optical integrated device
作者： Masaki Yanagisawa , Kenji Hiratsuka , Kenji Koyama , Hirohiko Kobayashi , Yoshihiro Yoneda
DOI:
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摘要: A method for producing a semiconductor optical integrated device includes the steps of forming substrate product including first and second stacked layer portions; mask on portions, stripe-shaped pattern region region, end edge; mesa structure; removing mask; portion; selectively growing buried with masks. The edge separated from mask, being located side portion in predetermined direction respect to mask.
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