作者: Chun-Hao Lin , Srinivas Polisetty , Liam O’Brien , Andrew Baruth , Marc A. Hillmyer
DOI: 10.1021/NN505731N
关键词: Permalloy 、 Overlayer 、 Ion beam 、 Nanolithography 、 Argon 、 Materials science 、 Nanodot 、 Nanotechnology 、 Atomic layer deposition 、 Optoelectronics 、 Lithography
摘要: Low-temperature atomic layer deposition of conformal ZnO on a self-assembled block polymer lithographic template comprising well-ordered, vertically aligned cylindrical pores within poly(styrene) (PS) matrix was used to produce nanocrucible templates with pore diameters tunable via thickness. Starting from PS hexagonal array 30 nm diameter 45 pitch, the thickness progressively increased narrow as low 14 nm. Upon removal by heat treatment in air at 500 °C form an size-tunable nanocrucibles, permalloy (Ni80Fe20) evaporated normal incidence, filling and creating overlayer. Argon ion beam milling then etch back overlayer (a Damascene-type process), leaving well-ordered isolated nanocrucibles filled nanodots. Microscopy temperature-dependent magnetometry verified reduction increasing The largest (30 ...