Size-Tuned ZnO Nanocrucible Arrays for Magnetic Nanodot Synthesis via Atomic Layer Deposition-Assisted Block Polymer Lithography

作者: Chun-Hao Lin , Srinivas Polisetty , Liam O’Brien , Andrew Baruth , Marc A. Hillmyer

DOI: 10.1021/NN505731N

关键词: PermalloyOverlayerIon beamNanolithographyArgonMaterials scienceNanodotNanotechnologyAtomic layer depositionOptoelectronicsLithography

摘要: Low-temperature atomic layer deposition of conformal ZnO on a self-assembled block polymer lithographic template comprising well-ordered, vertically aligned cylindrical pores within poly(styrene) (PS) matrix was used to produce nanocrucible templates with pore diameters tunable via thickness. Starting from PS hexagonal array 30 nm diameter 45 pitch, the thickness progressively increased narrow as low 14 nm. Upon removal by heat treatment in air at 500 °C form an size-tunable nanocrucibles, permalloy (Ni80Fe20) evaporated normal incidence, filling and creating overlayer. Argon ion beam milling then etch back overlayer (a Damascene-type process), leaving well-ordered isolated nanocrucibles filled nanodots. Microscopy temperature-dependent magnetometry verified reduction increasing The largest (30 ...

参考文章(36)
Muruganathan Ramanathan, Yu-Chih Tseng, Katsuhiko Ariga, Seth B. Darling, Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications Journal of Materials Chemistry C. ,vol. 1, pp. 2080- 2091 ,(2013) , 10.1039/C3TC00930K
Ming Luo, Thomas H. Epps, Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication Macromolecules. ,vol. 46, pp. 7567- 7579 ,(2013) , 10.1021/MA401112Y
A. Baruth, Myungeun Seo, Chun Hao Lin, Kern Walster, Arjun Shankar, Marc A. Hillmyer, C. Leighton, Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography. ACS Applied Materials & Interfaces. ,vol. 6, pp. 13770- 13781 ,(2014) , 10.1021/AM503199D
Christopher M. Bates, Michael J. Maher, Dustin W. Janes, Christopher J. Ellison, C. Grant Willson, Block Copolymer Lithography Macromolecules. ,vol. 47, pp. 2- 12 ,(2014) , 10.1021/MA401762N
A. Baruth, Marc D. Rodwogin, A. Shankar, M.J. Erickson, Marc A. Hillmyer, C. Leighton, Non-lift-off block copolymer lithography of 25 nm magnetic nanodot arrays. ACS Applied Materials & Interfaces. ,vol. 3, pp. 3472- 3481 ,(2011) , 10.1021/AM200693X
Soojin Park, Jia-Yu Wang, Bokyung Kim, Ji Xu, Thomas P. Russell, A Simple Route to Highly Oriented and Ordered Nanoporous Block Copolymer Templates ACS Nano. ,vol. 2, pp. 766- 772 ,(2008) , 10.1021/NN7004415
J. W. Elam, D. Routkevitch, P. P. Mardilovich, S. M. George, Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition Chemistry of Materials. ,vol. 15, pp. 3507- 3517 ,(2003) , 10.1021/CM0303080
Christophe Sinturel, Marylène Vayer, Michael Morris, Marc A. Hillmyer, Solvent Vapor Annealing of Block Polymer Thin Films Macromolecules. ,vol. 46, pp. 5399- 5415 ,(2013) , 10.1021/MA400735A
Charles T. Black, Polymer self-assembly as a novel extension to optical lithography. ACS Nano. ,vol. 1, pp. 147- 150 ,(2007) , 10.1021/NN7002663