Apparatus and method for blocking the deposition of oxide on a wafer
作者： Kunal N. Taravade
DOI:
关键词: Deposition (phase transition) 、 Optoelectronics 、 Wafer 、 Oxygen gas 、 Oxide 、 Electronic engineering 、 Blocking (radio) 、 Materials science
摘要: An apparatus for use in the deposition of oxide on a wafer, including chamber receiving oxygen gas that is used forming comprising: wafer chuck located within chamber, capable supporting during wafer; and an blocking member detached from preventing at least one predetermined area wafer.
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