Techniques for patterning features in semiconductor devices
作者： Arpan P. Mahorowala , Steven J. Holmes , Richard Stephan Wise , Katherina E. Babich , Dirk Pfeiffer
DOI:
关键词: Nanotechnology 、 Semiconductor device 、 Anti-reflective coating 、 Critical dimension 、 Materials science 、 Semiconductor 、 Lithography 、 Optoelectronics 、 Etching (microfabrication)
摘要: Techniques for semiconductor processing are provided. In one aspect, a method patterning or more features in device comprises the following step. At least critical dimension of is reduced during etching antireflective material. A lithographic structure also
lens.org 参考文章(26)
Mei-Sheng Zhou, Yuan-Ping Lee, Yong-Feng Lu, Jian-Hui Ye, Photoresist and polymer removal by UV laser aqueous oxidant ,(1998)
Bhanwar Singh, Angela T. Hui, Method of creating narrow trench lines using hard mask ,(2001)
Marina V. Plat, Chih-Yuh Yang, Ashok M. Khathuria, Russell R.A. Callahan, Philip A. Fisher, Enhanced transistor gate using E-beam radiation ,(2001)
Chih-I Wu, Jihperng Leu, Hyun-Mog Park, Method of making a semiconductor device by forming a masking layer with a tapered etch profile ,(2002)
Isao Satou, Kouichi Kuhara, Masataka Endo, Hiroaki Morimoto, Sub-0.10 um hole fabrication using bi-layer silylation process for 193 nm lithography international microprocesses and nanotechnology conference. ,vol. 38, pp. 7008- 7012 ,(1999) , 10.1143/JJAP.38.7008
Arpan Pravin Mahorowala, Scott David Halle, Marie Angelopoulos, Vishnubhai Vitthalbhai Patel, Katherina Babich, Alfred Grill, Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof ,(2001)
Chia Shiung Tsai, Yuan-Chang Huang, Chen-Hua Yu, 0.3 Micron aperture width patterning process ,(1996)
Kevin D. Lucas, Mark Slezak, Monique Ercken, Frieda Van Roey, 193-nm contact photoresist reflow feasibility study 26th Annual International Symposium on Microlithography. ,vol. 4345, pp. 725- 736 ,(2001) , 10.1117/12.436850
Jeong Hee Chung, Sang-Jun Choi, Yool Kang, Sang-Gyun Woo, Joo-Tae Moon, Novel resist material for sub-100-nm contact hole pattern Advances in Resist Technology and Processing XVII. ,vol. 3999, pp. 305- 312 ,(2000) , 10.1117/12.388315