Chemical vapor deposition of TiWC thin films
作者： Hua Xia Ji , Carmela C Amato-Wierda
DOI: 10.1016/S0257-8972(01)01342-1
关键词: Scanning electron microscope 、 Transmission electron microscopy 、 X-ray photoelectron spectroscopy 、 Analytical chemistry 、 Selected area diffraction 、 Carbon film 、 Chemical vapor deposition 、 Combustion chemical vapor deposition 、 Materials science 、 Thin film 、 Mineralogy
摘要: Abstract TiWC thin films were deposited on stainless steel substrates (440C) by chemical vapor deposition (CVD) in a horizontal hot-wall reactor from TiCl 4 W(CO) 6 CH H 2 Ar gaseous mixture, at 1323 K and pressures ranging 0.13 to 20.00 kPa. The structures of the characterized using X-ray diffraction (XRD). lattice constant shifts that TiC WC 1− x with increasing W concentration films. A morphological analysis was carried out scanning electron microscopy (SEM). It found surface morphology varied total flow. Compositional studies binding characteristics investigated photoelectron spectroscopy (XPS). associated hardness measured nano-indentation ranged 23 32 GPa. transmission (TEM) selected area (SAD) reveal detailed microstructure presence phase.
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sci-hub.se 参考文章(15)
S. Vepřek, S. Reiprich, A concept for the design of novel superhard coatings Thin Solid Films. ,vol. 268, pp. 64- 71 ,(1995) , 10.1016/0040-6090(95)06695-0
I. N. Mihailescu, Eniko Gyorgy, G. Marin, M. Popescu, V. S. Teodorescu, J. Van Landuyt, C. Grivas, A. Hatziapostolou, Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 17, pp. 249- 255 ,(1999) , 10.1116/1.581579
M. L. Garner, D. Chandra, K. H. Lau, Low-Temperature Vapor Pressures of W-, Cr-, and Co-Carbonyls Journal of Phase Equilibria. ,vol. 16, pp. 24- 29 ,(1995) , 10.1007/BF02646245
Bruce M. Kramer, Patrick K. Judd, Computational design of wear coatings Journal of Vacuum Science and Technology. ,vol. 3, pp. 2439- 2444 ,(1985) , 10.1116/1.572854
Muriel Touanen, Francis Teyssandier, Michel Ducarroir, Mohammed Maline, Roger Hillel, Jean Luc Derep, Microcomposite and Nanocomposite Structures from Chemical Vapor Deposition in the Silicon–Titanium–Carbon System Journal of the American Ceramic Society. ,vol. 76, pp. 1473- 1481 ,(1993) , 10.1111/J.1151-2916.1993.TB03928.X
Chang-Whan Won, Byong-Sun Chun, H.Y. Sohn, Preparation of ultrafine tungsten carbide powder by CVD method from WCl 6 -C 2 H 2 - H 2 mixtures Journal of Materials Research. ,vol. 8, pp. 2702- 2708 ,(1993) , 10.1557/JMR.1993.2702
N Chitica, Eniko Gyorgy, Adriana Lita, G Marin, I.N Mihailescu, D Pantelica, M Petrascu, A Hatziapostolou, C Grivas, N Broll, A Cornet, Codruta Mirica, A Andrei, Synthesis of tungsten carbide thin films by reactive pulsed laser deposition Thin Solid Films. ,vol. 301, pp. 71- 76 ,(1997) , 10.1016/S0040-6090(97)00001-1
G. Zambrano, P. Prieto, F. Perez, C. Rincon, H. Galindo, L. Cota-Araiza, J. Esteve, E. Martinez, Hardness and morphological characterization of tungsten carbide thin films Surface & Coatings Technology. ,vol. 108, pp. 323- 327 ,(1998) , 10.1016/S0257-8972(98)00686-0
Y. Hirayama, F. Koshiga, T. Sugano, Mesa- and planar-type InP metal/insulator/ semiconductor field effect transistors with plasma anodic Al2O3 gate oxide Thin Solid Films. ,vol. 103, pp. 71- 76 ,(1983) , 10.1016/0040-6090(83)90426-1
Y. Pauleau, Ph. Gouy-Pailler, Characterization of tungsten-carbon layers deposited on stainless steel by reactive magnetron sputtering Journal of Materials Research. ,vol. 7, pp. 2070- 2079 ,(1992) , 10.1557/JMR.1992.2070