Structure and Method of Sub-Gate and Architectures Employing Bandgap Engineered SONOS Devices

作者: Hang-Ting Lue , Hao Ming Lien

DOI:

关键词: Programming methodEngineeringElectrical engineeringGate oxideBand gapOverlay

摘要: A bandgap engineered SONOS device structure for design with various AND architectures to perform a source side injection programming method. The BE-SONOS comprises spacer oxide disposed between control gate overlaying an oxide-nitride-oxide-nitride-oxide stack and sub-gate oxide. In first embodiment, sub-gate-AND array architecture is constructed multiple columns of SONONOS devices lines diffusion bitlines. second sub-gate-inversion-bitline-AND inversion bitlines no

参考文章(82)
Noriyuki Shimoji, Takanori Ozawa, Hironobu Nakao, Semiconductor nonvolatile memory with wide memory window and long data retention time ,(1992)
Constantin Papadas, Remanent memory device ,(1998)
Geum-Jong Bae, Jin-Hee Kim, Sung-Ho Kim, Nae-in Lee, Ki Chul Kim, In-Wook Cho, Sang Su Kim, Kwang-Wook Koh, Local sonos-type structure having two-piece gate and self-aligned ono and method for manufacturing the same ,(2003)
Yen-Mao Shih, Hang-Ting Lue, Kuang-Yeu Hsieh, R. Liu, Chih-Yuan La, A novel 2-bit/cell nitride storage flash memory with greater than 1M P/E-cycle endurance international electron devices meeting. pp. 881- 884 ,(2004) , 10.1109/IEDM.2004.1419321
Kazuo Nakazato, Hiroshi Mizuta, Toshikazu Shimada, Toshihiko Sato, Haroon Ahmed, Kiyoo Itoh, Memory device with improved charge storage barrier structure ,(1997)
Tazrien Kamal, Yun Wu, Hidehiko Shiraiwa, Mark T. Ramsbey, Wei Zheng, Memory device having high work function gate and method of erasing same ,(2003)