P-Type Nitrogen-Doped ZnO Films Prepared by In-Situ Thermal Oxidation of Zn 3 N 2 Films

作者: Yu-Ping Jin , Bin Zhang , Jian-Zhong Wang , Li-Qun Shi

DOI: 10.1088/0256-307X/33/5/058101

关键词: Analytical chemistryMaterials scienceSpectroscopyAnnealing (metallurgy)Thermal oxidationDopingPhotoluminescenceElectrical resistivity and conductivityX-ray photoelectron spectroscopyAcceptor

摘要: P-type nitrogen-doped ZnO films are prepared successfully by in-situ thermal oxidation of Zn3N2 films. The characterized x-ray diffraction, non-Rutherford backscattering (non-RBS) spectroscopy, photoelectron and photoluminescence spectrum. results show that the start to transform at 400°C total nitrogen content decreases with increasing annealing temperature. p-type achieved 500°C a low resistivity 6.33Ωcm high hole concentration +8.82 × 1017 cm−3, as well level carbon contamination, indicating substitutional (NO) is an effective acceptor in ZnO:N film. spectra clear UV emissions also indicate presence oxygen vacancy (VO) defects doping mechanism briefly discussed.

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