The role of the arsenic source in selective epitaxial growth of GaAs and AlGaAs by MOMBE

作者: C R Abernathy , S J Pearton , F Ren , P W Wisk , J R Lothian

DOI: 10.1088/0268-1242/8/6/003

关键词: Crystal growthArsenicMolecular beam epitaxyNucleationTrimethylgalliumThin filmAnalytical chemistryEpitaxyTriethylgalliumChemistry

摘要: The authors have investigated the role of various arsenic precursors on selectivity GaAs and AlGaAs at low deposition temperatures,

参考文章(11)
G.J. Davies, P.J. Skevington, C.L. French, J.S. Foord, Selective area growth of III–V compound semiconductors by chemical beam epitaxy Journal of Crystal Growth. ,vol. 120, pp. 369- 375 ,(1992) , 10.1016/0022-0248(92)90420-N
CR Abernathy, PW Wisk, SJ Pearton, F Ren, Effect of electron cyclotron resonance generated hydrogen plasmas on carbon incorporation and interfacial quality of GaAs and AlGaAs grown by metalorganic molecular-beam epitaxy Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 10, pp. 2153- 2156 ,(1992) , 10.1116/1.586182
H. Heinecke, A. Brauers, F. Grafahrend, C. Plass, N. Pütz, K. Werner, M. Weyers, H. Lüth, P. Balk, Selective growth of GaAs in the MOMBE and MOCVD systems Journal of Crystal Growth. ,vol. 77, pp. 303- 309 ,(1986) , 10.1016/0022-0248(86)90316-7
C.R. Abernathy, P.W. Wisk, S.J. Pearton, F. Ren, D.A. Bohling, G.T. Muhr, Alternative group V sources for growth of GaAs and AlGaAs by MOMBE (CBE) Journal of Crystal Growth. ,vol. 124, pp. 64- 69 ,(1992) , 10.1016/0022-0248(92)90438-O
A. Schütze, J. Zacheja, M. Weyers, D. Kohl, Surface chemistry of a new III–V MOCVD reactant: PhAsH2 on GaAs(100) Journal of Crystal Growth. ,vol. 107, pp. 1036- 1037 ,(1991) , 10.1016/0022-0248(91)90598-Y
Y. Hiratani, Y. Ohki, Y. Sugimoto, K. Akita, In-situ selective-area epitaxy of GaAs using a GaAs oxide layer as a mask Journal of Crystal Growth. ,vol. 111, pp. 570- 573 ,(1991) , 10.1016/0022-0248(91)91041-8
Eisuke Tokumitsu, Toshiaki Katoh, Ryuhei Kimura, Makoto Konagai, Kiyoshi Takahashi, Preparation of GaAs and Ga1-xAlxAs Multi-Layer Structures by Metalorganic Molecular Beam Epitaxy Japanese Journal of Applied Physics. ,vol. 25, pp. 1211- 1215 ,(1986) , 10.1143/JJAP.25.1211
Eisuke Tokumitsu, Yoshimitsu Kudou, Makoto Konagai, Kiyoshi Takahashi, Molecular beam epitaxial growth of GaAs using trimethylgallium as a Ga source Journal of Applied Physics. ,vol. 55, pp. 3163- 3165 ,(1984) , 10.1063/1.333344
C. R. Abernathy, P. W. Wisk, D. A. Bohling, G. T. Muhr, Growth of GaAs and AlGaAs by metalorganic molecular beam epitaxy using tris-dimethylaminoarsenic Applied Physics Letters. ,vol. 60, pp. 2421- 2423 ,(1992) , 10.1063/1.106992
M. Weyers, MOMBE and MOVPE—A comparison of growth techniques Progress in Crystal Growth and Characterization. ,vol. 19, pp. 83- 96 ,(1989) , 10.1016/0146-3535(89)90014-2