Growth of iron nitride thin films by molecular beam epitaxy
作者： Michio Naito , Koji Uehara , Rikimaru Takeda , Yoshitaka Taniyasu , Hideki Yamamoto
DOI: 10.1016/J.JCRYSGRO.2014.12.022
关键词: Thin film 、 Evaporation 、 Molecular beam epitaxy 、 Analytical chemistry 、 Iron nitride 、 Epitaxy 、 Crystallography 、 Materials science
摘要: … with high Fe evaporation rates (≥1.0 Å/s) at 130–415 C. Our results indicate that the stabilization of ZnS-type FeN requires not only the fulfillment of thermodynamic constraints but also …
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