Frequency response of the surface inversion layer in silicon

作者: S.R. Hofstein , K.H. Zaininger , G. Warfield

DOI: 10.1109/PROC.1964.3196

关键词: SiliconFrequency responseElectronic engineeringOptoelectronicsResponse surface methodologyInversion (meteorology)CapacitanceMaterials science

摘要:

参考文章(3)
M.M. Atalla, A.R. Bray, R. Lindner, Stability of thermally oxidized silicon junctions in wet atmospheres Proceedings of the IEE - Part B: Electronic and Communication Engineering. ,vol. 106, pp. 1130- 1137 ,(1959) , 10.1049/PI-B-2.1959.0204
W. Shockley, H. J. Queisser, W. W. Hooper, Charges on Oxidized Silicon Surfaces Physical Review Letters. ,vol. 11, pp. 489- 490 ,(1963) , 10.1103/PHYSREVLETT.11.489
K. Lehovec, A.C. impedance of semiconductor-insulator-metal capacitors Solid-State Electronics. ,vol. 6, pp. 536- 539 ,(1963) , 10.1016/0038-1101(63)90041-8