Lithographic apparatus, substrate support system, device manufacturing method and control program
作者： Ramidin Izair Kamidi , Khalid Manssouri , Wilhelmus Henricus Theodorus Maria Aangenent , Der Wal Marinus Maria Johannes Van
DOI:
关键词: Actuator 、 Control (management) 、 Control theory 、 Control theory 、 Lithography 、 Transformation matrix 、 Substrate (printing) 、 Control system 、 Electrical engineering 、 Engineering 、 Object (computer science)
摘要: A lithographic apparatus including: an object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein are over- determined in actuator degree freedom; control system including transformation matrix generate controller output signals for each response sequence setpoints, is such that do not excite dynamics at least one freedom.
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