Automated semiconductor processing system
作者： Jeffrey A. Davis , Gary L. Curtis
DOI:
关键词: Wafer 、 Electrical engineering 、 Interface (computing) 、 Semiconductor 、 Engineering
摘要: A semiconductor processing system for wafers or other articles. The uses an interface section at end of the machine accessible from clean room. plurality stations are arranged away room interface. transfer subsystem removes supporting carriers, and positions both carriers onto a carrousel which is used as inventory storage. Wafers shuttled between by robotic conveyor oriented to move toward end. processes without wafer carriers.
google.nl 参考文章(183)
Don C. Burkman, Cooky Mezaki, Jitesh R. Mehta, Apparatus and process for static drying of substrates ,(1987)
Robert R. Matthews, Semiconductor wafer end effector ,(1993)
Takanobu Asano, Hiroyuki Iwai, Yuji Ono, Method of loading and unloading wafer boat ,(1991)
Raymond S. Martin, Anthony C. Bonora, William J. Fosnight, Ergonomic, variable size, bottom opening system compatible with a vertical interface ,(1998)
Katsumi Ishii, Yoshinori Mochizuki, Horizontal/vertical conversion handling apparatus ,(1990)
Johann Tam, Method and apparatus for drying wafers ,(1980)
Eric D. Pierson, Disk cleaning apparatus ,(1990)
James S. Molinaro, Flexible carrier for semiconductor wafer cassettes ,(1987)
Steven N. Lee, Wafer interleaving with electro-optical safety features ,(1989)
Eric J. Bergman, Aqueous hydrofluoric acid vapor processing of semiconductor wafers ,(1992)