Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy
作者： Mikko Ritala , Markku Leskelä , Lauri Niinistö , Thomas Prohaska , Gernot Friedbacher
DOI: 10.1016/0040-6090(94)90168-6
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摘要: … However, little attention was paid to the structural properties of the pure HfO2 films: it was only reported that the films grown at 300 C were crystalline, having the monoclinic structure, …
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