Cleaning apparatus for semiconductor wafer
作者： Minoru Doi
DOI:
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摘要: A cleaning apparatus for a semiconductor wafer comprising: double container including an inner with upper opening accommodating substrate to be cleaned and outer having airtight space the therein, being communicated through opening; liquid supply conduit supplying into container; drain draining from solvent-containing gas drying substrate; solvent-resolving resolving solvent component attached on exhaust pipe exhausting gases container, spilled container.
lens.org 参考文章(15)
Jong-jae Lee, Chan-geun Park, Vacuum dryer of drying semiconductor device using the same ,(1998)
George Fiegl, Walter Torbet, Conduit for high temperature transfer of molten semiconductor crystalline material ,(1979)
Kaoru Shinbara, Nobuyuki Hirai, Hitoshi Yoshioka, Masato Tanaka, Hisao Nishizawa, Wafer cleaning method and apparatus therefore ,(1992)
Robert Bruce Eglinton, Glenn Alvin Roberson, Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol ,(1990)
Mario E. Bran, Michael B. Olesen, Semiconductor wafer cleaning system ,(1997)
Yun Jun Huh, Suk Bin Han, Semiconductor wafer cleaning apparatus ,(1997)
Kenichi Kawasumi, Akiisa Inada, Cleaning and removal of organic substance ,(1987)
Koji Watabe, 宏治 渡部, Method and device for pre-process for forming gate insulating film ,(1999)
Fujikawa Kazunori, BOARD TREATMENT METHOD AND BOARD TREATMENT DEVICE ,(1997)
Koyanagi Tetsuo, Yamaguchi Hiroshi, METHOD AND DEVICE FOR PREVENTING SUBSTRATE ELECTRIFICATION, AND SUBSTRATE CLEANING DEVICE ,(1999)