摘要: A process called SCREAM for Single Crystal Reactive Etching And Metallization is used to make MicroElectroMechanical Systems (MEMS). The yields high-aspect-ratio (>50:1) released, single crystal silicon structures with micrometer-scale minimum features and a suspension span of greater than 5 millimeters. Such include picofarad sensing capacitors high force actuators that generate milli-Newton forces (100mN/cm^2 at 40 Volts) controllable, three dimensional motion displacements. Examples devices microinstruments materials testing or loading instrument, micro-scanning tunneling microscopes.
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