Substrate processing apparatus using a batch processing chamber
作者： Steve G. Ghanayem , Andreas G. Hegedus , Aaron Webb , Adam Alexander Brailove , Nir Merry
DOI:
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摘要: Aspects of the invention include a method and apparatus for processing substrate using multi-chamber system (e.g., cluster tool) adapted to process substrates in one or more batch and/or single chambers increase throughput. In embodiment, is configured perform sequence that contains only, chambers, optimize throughput minimize defects. chamber used by performing recipe step disproportionately long compared other steps sequence. also an delivering precursor so repeatable ALD CVD deposition can be performed.
google.de 参考文章(57)
Pradip Kumar Roy, Konstantin K. Bourdelle, Method for making a photoresist layer having increased resistance to blistering, peeling, lifting, or reticulation ,(2000)
Mikio Minonishi, Akihiro Ohsawa, Kenichi Bandoh, Substrate temperature control plate and substrate temperature control apparatus comprising same ,(2000)
Ajay Kumar, Ramesh Krishnamurthy, Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor ,(2006)
Hiroshi Kuroki, Tetsuya Takami, Hitoshi Wakata, Kazuo Kuramoto, Naohiko Fujino, Mutsumi Tsuda, Tsuyoshi Horikawa, Takaaki Kawahara, Kenichi Kuroda, Yukihiko Wada, Kazuyoshi Kojima, Taisuke Furukawa, Noboru Mikami, Koichi Ono, Tetsuro Makita, Kouji Kise, Hideki Yabe, Tomohiro Sasagawa, Junji Tanimura, Akihiko Furukawa, Akihiro Suzuki, Keisuke Nanba, Yoshio Saito, Toshiyuki Oishi, Akimasa Yuki, Kenyu Haruta, Tetsuo Ogama, Yasuji Matsui, Thin film forming apparatus using laser ,(1993)
Louis E. Peters, Lowell E. Simmons, Randall E. Johnson, Low particulate vacuum chamber input/output valve ,(1984)
Steven Verhaverbeke, Christopher Laurent Beaudry, Single wafer cleaning method to reduce particle defects on a wafer surface ,(2003)
Reginald Hunter, Joel Brad Bailey, Method for enhancing substrate processing ,(2002)
Dan L. Cossentine, Bruce E. Mayer, Frank S. Menagh, Helder R. Carvalheira, Eric R. Vaughan, Philip A. Troiani, Richard N. Savage, Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system ,(2000)
Reginald Hunter, Sensor device for non-intrusive diagnosis of a semiconductor processing system ,(2006)
Daniel L Brors, Robert C Cook, James Mitchener, Gabe Ormonde, High rate deposition at low pressures in a small batch reactor ,(2003)