PANAMAP-B: A Mask Verification System for Bipolar IC

摘要: As the complexity of IC/LSI structures increase, verification mask designs becomes extremely difficult and time-consuming. Also, an pattern design requires much man-power as well. Further, actual circuit realized onto chips may be quite different from that originally intended because parasitic elements, including capacitors, resistors, transistors. Computer support is considered very important useful for design. This paper describes all functions PANAMAP-B (Panasonic Mask Analysis Program Bipolar IC). The main features are: one, no restriction about edge angles polygonal patterns; two, distributed constant representation interconnecting conductors diffusion resistors.