Ampoule splash guard apparatus
作者： Steve H. Chiao , Wei Ti Lee
DOI:
关键词:
摘要: Embodiments of the invention provide an apparatus for generating a precursor gas used in vapor deposition process system. The contains canister or ampoule containing chemical and splash guard contained within ampoule. is positioned to obstruct liquid state from being bumped splashed into outlet during introduction carrier usually directed through inlet combines with vaporized form gas. also permit passage outlet. In one example, stem tapered tip at angle parallel plane tip.
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