作者: P. Chevalier , B. Barbalat , M. Laurens , B. Vandelle , L. Rubaldo
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摘要: This paper presents the status of high-speed SiGe BiCMOS technologies at STMicroelectronics. Process and electrical characteristics two 120-nm platforms, qualified or under development, are presented together with results demonstrated on optical millimeter-wave circuits. Advanced developments addressing end-of-roadmap also discussed