作者: M.J. Deen , C.-H. Chen , S. Asgaran , G.A. Rezvani , J. Tao
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摘要: Compact modeling of the most important high-frequency (HF) noise sources MOSFET is presented in this paper, along with challenges measurement and deembedding future CMOS technologies. Several channel thermal models are reviewed their ability to predict extremely small devices discussed. The impact technology scaling on performance MOSFETs also investigated by means analytical expressions. It shown that gate tunneling current has a significant parameters, especially at lower frequencies. Limitations some commonly used predicting HF parameters modern addressed methods alleviate limitations discussed