Auger electron spectroscopy of surfaces during exposure to gaseous discharges

作者: Joydeep Guha , Yi-Kang Pu , Vincent M. Donnelly

DOI: 10.1116/1.2699167

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摘要: The authors report for the first time Auger electron spectroscopy (AES) of a surface while it is exposed to high pressure, reactive environment: 5mTorr inductively coupled plasma. An anodized aluminum cylindrical substrate (a common plasma reactor coating) was rotated within wall. Differential pumping allowed be plasma, and then AES as little 1ms thereafter. Electron-beam-induced charging, severe problem conventional analysis insulators, remediated in this experiment because maintains at constant floating potential. Chlorine, oxygen, nitrogen plasmas were investigated. O2 are effective removing Cl from Cl2 plasma-conditioned surfaces; N2 not. During exposure, coverage does not decrease with increasing delay between exposure analysis, varied by varying rotation frequency. This contrary desorption (detected line-of-sight ma...

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