Study on the in-line sputtering growth and structural properties of polycrystalline ZnO:Al on ZnO and glass

作者: Jorj I. Owen , Wendi Zhang , Dominik Köhl , Jürgen Hüpkes

DOI: 10.1016/J.JCRYSGRO.2012.01.043

关键词:

摘要: This work endeavors to develop a better understanding of the growth aluminum doped zinc oxide (ZnO:Al) films under relevant sputtering conditions that after etching yield good light trapping structures for use in thin-film silicon solar cells. The and characteristics grown on various substrates, including texture etched ZnO:Al, ZnO single crystals, glass, are examined. ZnO:Al is shown grow quasi-epitaxially textured surface. While new maintains topographical features, similar roughness, c-axis orientation, sites craters formed during altered. inclusion buffer layer between reset c-axis. Growth glass indicate columnar oriented grains primarily Zn-terminated. A model proposed explain observed differences substrates.

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