作者: Mao-Min Chen , Min Li , Ru-Ying Tong , Liubo Hong , Cheng T. Horng
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摘要: A high performance MTJ in an MRAM array is disclosed which the bottom conductor has amorphous Ta capping layer. key feature a surfactant layer comprised of oxygen that formed on surface. The resulting smooth and flat promotes surface layers are subsequently For 0.3×0.6 micron bit size, 35 to 40 Angstrom thick NiFe(18%) free layer, AlOx barrier generated from ROX oxidation 9 10 Al Ru/Ta/Ru employed give dR/R >40% RA about 4000 ohm-μm2. configuraton extendable 0.2×0.4 size.