Nonvolatile memory with split substrate select gates and hierarchical bitline configuration

作者: Hyoung Seub Rhie

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摘要: Generally, the present disclosure provides a non-volatile memory device having hierarchical bitline structure for preventing erase voltages applied to one group of cells array from leaking other groups in which erasure is not required. Local bitlines are coupled each cells. Each local can be selectively connected global during read operations selected group, and all disconnected an operation when specific erasure. Select devices electrically connecting have bodies that isolated those

参考文章(57)
L. Crippa, R. Micheloni, I. Motta, M. Sangalli, Nonvolatile Memories: NOR vs. NAND Architectures Springer, Berlin, Heidelberg. pp. 29- 53 ,(2008) , 10.1007/978-3-540-79078-5_2
Kuang-Yeu Hsieh, Hang-Ting Lue, Shih-Hung Chen, Semiconductor structure and manufacturing method of the same ,(2012)
Hoosung Cho, Jaehun Jeong, Jaehoon Jang, Kyoung-hoon Kim, Hansoo Kim, Nonvolatile memory devices having a three dimensional structure ,(2010)
Jung-Dal Choi, Ki-tae Park, Uk-Jin Roh, Semiconductor device having a field effect source/drain region ,(2006)
Hang-Ting Lue, Shih-Hung Chen, Chun-Hsiung Hung, Memory architecture of 3D array with improved uniformity of bit line capacitances ,(2011)
MeiKei Ieong, H.-S.P. Wong, Yuan Taur, P. Oldiges, D. Frank, DC and AC performance analysis of 25 nm symmetric/asymmetric double-gate, back-gate and bulk CMOS international conference on simulation of semiconductor processes and devices. pp. 147- 150 ,(2000) , 10.1109/SISPAD.2000.871229