Influence of sputter oxygen partial pressure on photoelectrochemical performance of tungsten oxide films
作者： Bjorn Marsen , Brian Cole , Eric L. Miller
DOI: 10.1016/J.SOLMAT.2007.08.008
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摘要: Abstract Polycrystalline tungsten oxide films of 1–1.2μm thickness were prepared by reactive sputtering at elevated substrate temperature (270 °C) and under different oxygen partial pressures in the range from 0.8 to 2.1 mTorr. At lowest pressure substoichiometric, showed increased disorder, exhibited photocurrents 0.6 mA/cm 2 1.8 V vs SCE 0.33 M H 3 PO 4 . 1.4 mTorr greater, stoichiometric WO produced which 2.4 mA/cm SCE. It has been determined that photoelectrochemical performance slightly substoichiometric is adversely affected changes optical properties, while severely suffer additionally poor carrier collection.
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sci-hub.se 参考文章(22)
E. Salje, Lattice dynamics of WO3 Acta Crystallographica Section A. ,vol. 31, pp. 360- 363 ,(1975) , 10.1107/S0567739475000757
P.M. Woodward, A.W. Sleight, T. Vogt, Structure refinement of triclinic tungsten trioxide Journal of Physics and Chemistry of Solids. ,vol. 56, pp. 1305- 1315 ,(1995) , 10.1016/0022-3697(95)00063-1
Heli Wang, Torbjörn Lindgren, Jianjun He, Anders Hagfeldt, Sten-Eric Lindquist, Photoelectrochemistry of Nanostructured WO3 Thin Film Electrodes for Water Oxidation: Mechanism of Electron Transport Journal of Physical Chemistry B. ,vol. 104, pp. 5686- 5696 ,(2000) , 10.1021/JP0002751
Eric L. Miller, Daniela Paluselli, Bjorn Marsen, Richard E. Rocheleau, Development of reactively sputtered metal oxide films for hydrogen-producing hybrid multijunction photoelectrodes Solar Energy Materials and Solar Cells. ,vol. 88, pp. 131- 144 ,(2005) , 10.1016/J.SOLMAT.2004.07.058
Renata Solarska, Bruce D. Alexander, Jan Augustynski, Electrochromic and photoelectrochemical characteristics of nanostructured WO3 films prepared by a sol-gel method Comptes Rendus Chimie. ,vol. 9, pp. 301- 306 ,(2006) , 10.1016/J.CRCI.2005.02.044
Clara Santato, Martine Ulmann, Jan Augustynski, Photoelectrochemical Properties of Nanostructured Tungsten Trioxide Films Journal of Physical Chemistry B. ,vol. 105, pp. 936- 940 ,(2001) , 10.1021/JP002232Q
M.F. Daniel, B. Desbat, J.C. Lassegues, B. Gerand, M. Figlarz, Infrared and Raman study of WO3 tungsten trioxides and WO3, xH2O tungsten trioxide tydrates Journal of Solid State Chemistry. ,vol. 67, pp. 235- 247 ,(1987) , 10.1016/0022-4596(87)90359-8
A Yamamoto, Y Abe, M Kawamura, K Sasaki, Effects of oxygen gettering and target mode change in the formation process of reactively RF sputtered WOx thin films Vacuum. ,vol. 66, pp. 269- 273 ,(2002) , 10.1016/S0042-207X(02)00153-7
I. Jiménez, J. Arbiol, G. Dezanneau, A. Cornet, J.R. Morante, Crystalline structure, defects and gas sensor response to NO2 and H2S of tungsten trioxide nanopowders Sensors and Actuators B-chemical. ,vol. 93, pp. 475- 485 ,(2003) , 10.1016/S0925-4005(03)00198-9
K. Miyake, H. Kaneko, Y. Teramoto, Electrical and optical properties of reactively sputtered tungsten oxide films Journal of Applied Physics. ,vol. 53, pp. 1511- 1515 ,(1982) , 10.1063/1.330649