Mass transfer analyses of the plasma deposition process
作者： Inan Chen
DOI: 10.1016/0040-6090(83)90491-1
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摘要: Abstract A mathematical description of mass transfer in the glow discharge plasma deposition process ( e.g. preparation amorphous silicon from silane) is presented. In particular, analysis concerns itself with elements important fabrication practical devices. The relationships between characteristics i.e. thickness uniformity, rate and gas efficiency) parameters (gas flow electrical power) are examined by numerical modeling techniques. Two types reactor structure, axial radial flow, considered.
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