Microstructural investigations of polycrystalline Ti2AlN prepared by physical vapor deposition of Ti-AlN multilayers
作者： Lukas Gröner , Lutz Kirste , Sabine Oeser , Alexander Fromm , Marco Wirth
DOI: 10.1016/J.SURFCOAT.2017.09.042
关键词:
摘要: Abstract Ti 2 AlN is a prominent ternary nitride and belongs to the class of nanolaminated M n + 1 AX n phase materials which combine metallic ceramic properties. In this work we report on successful synthesis polycrystalline thin films with preferential (000l) orientation Al O 3 substrate by depositing multiple Ti-AlN double layers applying subsequent annealing step. Investigations scanning electron microscopy (SEM), X-ray diffraction (XRD), back scatter (EBSD) Raman spectroscopy reveal transformation multilayer system into dense coating thickness 2.7 μm. The observed grains are plate-like shaped an in-plane size about 100 300 nm 30 60 nm. Furthermore EBSD measurements proof that these macroscopic have preferred in [000l] direction. We believe (000l)-textured microstructure will lead new applications for protective coatings substrates.
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