A bottom-up approach to nanotechnology using DNA

Nadrian Seeman , X. Yang , H. Yan , Ruojie Sha
IBC Libraries 45 -58

3
1998
Enhancement-mode Ga2O3 MOSFETs with Si-ion-implanted source and drain

Man Hoi Wong , Yoshiaki Nakata , Akito Kuramata , Shigenobu Yamakoshi
Applied Physics Express 10 ( 4) 041101

66
2017
New motifs in DNA nanotechnology

Nadrian C Seeman , Hui Wang , Xiaoping Yang , Furong Liu
Nanotechnology 9 ( 3) 257 -273

113
1998
Depletion-mode Ga2O3 MOSFETs on β-Ga2O3 (010) substrates with Si-ion-implanted channel and contacts

Masataka Higashiwaki , Kohei Sasaki , Man Hoi Wong , Takafumi Kamimura
2013 IEEE International Electron Devices Meeting

36
2013
Invited: Process and Characterization of Vertical Ga 2 O 3 Transistors

Masataka Higashiwaki , Man Hoi Wong , Ken Goto , Hisashi Murakami
international meeting for future of electron devices, kansai

2019
Anomalous Output Conductance in N-Polar GaN High Electron Mobility Transistors

Man Hoi Wong , Uttam Singisetti , Jing Lu , James S. Speck
IEEE Transactions on Electron Devices 59 ( 11) 2988 -2995

12
2012
Nitrogen-Doped Channel $\beta$ -Ga 2 O 3 MOSFET with Normally-Off Operation

Takafumi Kamimura , Yoshiaki Nakata , Man Hoi Wong , Phuc Hong Than
international conference on indium phosphide and related materials

2019
Dynamic $\mathrm{R}_{\mathrm{ON}}$ in $\beta$ -Ga 2 O 3 MOSFET Power Devices

Taylor Moule , Manikant Singh , James Pomeroy , Serge Karboyan
international conference on indium phosphide and related materials

2019
$\beta$ -Ga 2 O 3 MOSFETs with Nitrogen-Ion-Implanted Back-Barrier: DC Performance and Trapping Effects

Ken Goto , Hisashi Murakami , Yoshinao Kumagai , Masataka Higashiwaki
international conference on indium phosphide and related materials

2019
Invited) Fundamentals and Process Technologies of Current Aperture Vertical Ga2O3 MOSFETs

Man Hoi Wong , Ken Goto , Hisashi Murakami , Yoshinao Kumagai
ECS Meeting Abstracts ( 23) 1327 -1327

2020
RF Performance of Deep-Recessed N-Polar GaN MIS-HEMTs Using a Selective Etch Technology Without Ex Situ Surface Passivation

Seshadri Kolluri , David F. Brown , Man Hoi Wong , S. Dasgupta
IEEE Electron Device Letters 32 ( 2) 134 -136

11
2011
Enhancement-Mode N-Polar GaN MOS-HFET With 5-nm GaN Channel, 510-mS/mm $g_{m}$ , and 0.66- $\Omega\cdot \hbox{mm}$ $R_{\rm on}$

Uttam Singisetti , Man Hoi Wong , James S. Speck , Umesh K. Mishra
IEEE Electron Device Letters 33 ( 1) 26 -28

30
2012
Current Aperture Vertical $\beta$ -Ga 2 O 3 MOSFETs Fabricated by N- and Si-Ion Implantation Doping

Man Hoi Wong , Ken Goto , Hisashi Murakami , Yoshinao Kumagai
IEEE Electron Device Letters 40 ( 3) 431 -434

44
2019
Vertical Ga 2 O 3 Schottky Barrier Diodes With Guard Ring Formed by Nitrogen-Ion Implantation

Chia-Hung Lin , Yohei Yuda , Man Hoi Wong , Mayuko Sato
IEEE Electron Device Letters 40 ( 9) 1487 -1490

37
2019
Enhancement-Mode $\beta$ -Ga 2 O 3 Current Aperture Vertical MOSFETs With N-Ion-Implanted Blocker

Man Hoi Wong , Hisashi Murakami , Yoshinao Kumagai , Masataka Higashiwaki
IEEE Electron Device Letters 41 ( 2) 296 -299

14
2020
Field-Plated Ga 2 O 3 MOSFETs With a Breakdown Voltage of Over 750 V

Man Hoi Wong , Kohei Sasaki , Akito Kuramata , Shigenobu Yamakoshi
IEEE Electron Device Letters 37 ( 2) 212 -215

473
2016
Vertical $\beta$-Ga₂O₃ power transistors: A review

Man Hoi Wong , Masataka Higashiwaki
IEEE Transactions on Electron Devices 67 ( 10) 3925 -3937

65
2020
on $\beta$-Ga2O3 (010) substrates and temperature dependence of their device characteristics

Masataka Higashiwaki , Kohei Sasaki , Takafumi Kamimura , Man Hoi Wong
Applied Physics Letters 103 123511

20
2013