Process for fabricating submicron single crystal electromechanical structures
作者： Noel C. MacDonald , Zhoying L. Zhang , Gyorgy A. Porkolab
DOI:
关键词: Single crystal 、 Reactive-ion etching 、 Process (computing) 、 Nitride 、 Nanotechnology 、 Ion beam etching 、 Crystal orientation 、 Substrate (printing) 、 Materials science
摘要: A process for fabricating submicron movable mechanical structures utilizes chemically assisted ion beam etching and reactive which are independent of crystal orientation. The provides released may be the same material or different materials than surrounding substrate, a nitride coating provided on structure optical applications.
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