Detection and Electrical Characterization of Defects at the SiO2/4H-SiC Interface

作者: Michael Krieger , Svetlana Beljakowa , Bernd Zippelius , Valeri V. Afanas'ev , Anton J. Bauer

DOI: 10.4028/WWW.SCIENTIFIC.NET/MSF.645-648.463

关键词: DielectricSpectral lineBand gapVoltageAnalytical chemistryThermalCondensed matter physicsCharacterization (materials science)OxideMaterials scienceRelaxation (NMR)

摘要: … 2: Density of interface traps Dit as a function of the energy Eit in the bandgap of 4H-SiC taken on a MOS capacitor #1 with a ”thick” oxide (dox = 40nm) by means of TDRC (circles) and …

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