MEMS device and method of making the same

作者: Ming-I Wang , Li-Hsun Ho , Hui-Min Wu , Wei-Cheng Wu , Chien-Hsin Huang

DOI:

关键词: Layer (electronics)Structural engineeringMicroelectromechanical systemsSubstrate (printing)Manufacturing processOptoelectronicsEngineering

摘要: A MEMS device includes a vent hole structure and disposed on same side of substrate. The adjoins the with an etch stop therebetween. chamber, metal layer having at least thereon as to connect chamber through structure. Accordingly, has lateral hole. Furthermore, are substrate, manufacturing process is convenient timesaving.

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Tzung-I Su, Li-Hsun Ho, Hui-Min Wu, Wei-Cheng Wu, Chien-Hsin Huang, Min Chen, Bang-Chiang Lan, Integrated structure for MEMS device and semiconductor device and method of fabricating the same ,(2008)