Multi‐ion‐beam reactive sputter deposition of ferroelectric Pb(Zr,Ti)O3 thin films
作者： S. B. Krupanidhi , H. Hu , V. Kumar
DOI: 10.1063/1.350719
关键词: Sputtering 、 Analytical chemistry 、 Lead zirconate titanate 、 Ion beam 、 Ferroelectricity 、 Thin film 、 Crystallization 、 Sputter deposition 、 Materials science 、 Mineralogy 、 Ion implantation
摘要: A multi‐ion‐beam reactive sputter (MIBERS) deposition technique was devised to grow ferroelectric lead zirconate titanate (PZT) thin films of different compositions (Zr/Ti ratios 50/50 and 56/44) from individual metal targets Pb, Zr, Ti. This offers a highly controllable process allowing excellent uniformity in composition thickness over large area (7.5 cm diameter) on reproducible basis. The PZT were deposited variety unheated substrates annealed by two techniques, rapid thermal annealing conventional furnace annealing. Both techniques induced perovskite phase with good morphology. effect the excess Pb content observed terms crystallization It seen that presence tends enhance formation but degrades orientation. low‐energy oxygen ion beam employed modify f...
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