摘要: When mirror-polished, flat, and clean wafers are brought into contact, they locally attracted to each other adhere or bond. This phenomenon is known as semiconductor wafer bonding. Different adhesion forces (van der Waals forces, hydrogen bonding) the reason for bonding effect at room temperature. The different mechanisms acting in dependence on surface conditions (hydrophilic, hydrophobic) reviewed. Variations of properties bonded interfaces (structural, mechanical, electrical) during annealing discussed. focus low-temperature techniques. Reasons formation interface defects presented. Applications future developments briefly summarized.