Plasma-based ion implantation and deposition: a review of physics, technology, and applications

作者: J. Pelletier , A. Anders

DOI: 10.1109/TPS.2005.860079

关键词:

摘要: … Another example of having deposition involved is when the processing gas is a precursor gas whose radicals can condense and form a film. The most popular example is the …

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