作者: Maodong Zhu , Hu Wang , Bin Wang , Hongji Qi , Dongping Zhang
DOI: 10.1016/J.CERAMINT.2018.10.043
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摘要: Abstract To study the effect of high-energy X-ray irradiation on thermochromic properties VO 2 films, we prepared films fused silica substrates by direct-current reactive magnetron sputtering and exposed them to at various doses in range 0–9000 Gy. diffraction analysis showed that an appropriate dose (1500 Gy) can enhance crystallization whereas a higher (9000 Gy) would reduce crystallinity slightly. XPS measurement indicated film irradiated 1500 Gy had maximum V 4+ content (71.64%) among samples. Moreover, atomic force microscopy scanning electron measurements suggested samples treated surface roughness than other possibly owing localized annealing lower doses. The visible infrared transmittance pristine were characterized analyzed. results demonstrated strongly influenced room-temperature decreased monotonously as increased formation color centers. In addition, phase transition temperature from 48 °C for sample 53 °C 1500 Gy, then continuously 43 °C 9000 Gy. These findings provided valuable insight into modification vanadium dioxide irradiation.