Substrate processing method
作者： Nicolas Nadaud , Marcus Loergen , Uwe Schmidt , Stephanie Roche
DOI:
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摘要: Method for the treatment of at least one surface portion layer A located between a substrate and B thin-film multilayer, layers which are vacuum-deposited on having glass function, according to invention, is characterized in that: thin deposited said substrate, this deposition phase being carried out by vacuum process; using linear ion source, plasma ionized species generated from gas or mixture; subjected so that partly modifies state A; A, process.
lens.org 参考文章(6)
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