作者: M. Charleux , J. L. Rouvière , J. M. Hartmann , A. Bourret
DOI: 10.1063/1.368134
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摘要: We have measured by high resolution transmission electron microscopy (HRTEM) the width of interfaces in two II–VI heterostructures: CdTe/MnTe and CdTe/MgTe, as a function growth mode. A critical review different parameters involved direct determination chemical profile HRTEM enables us to precisely determine sensitivity accuracy methods on these particular materials. The interface is order 2.5–3 monolayers (ML) compatible with an exchange mechanism involving monolayer being grown last deposited monolayer. Several procedures were compared: conventional molecular beam epitaxy atomic layer (ALE). In case saturated oversaturated ALE inverse MnTe/CdTe no longer planar. destabilization front occurs when one or more Mn per cycle are deposited, through formation MnTe islands. Thermal interdiffusion seems be negligible Mn. present values for widths extend results obtained magneto-optical measurements higher concentration confirm mechanism. value x-ray reflectivity (4.7 ML) explained large difference average volume which measurement performed.