Transport properties of GaAs1−xNx thin films grown by metalorganic chemical vapor deposition

作者: R. K. Ahrenkiel , S. W. Johnston , B. M. Keyes , D. J. Friedman , S. M. Vernon

DOI: 10.1063/1.1328774

关键词: InfraredBand gapGallium arsenideExcitationThin filmMaterials scienceStretched exponential functionOptoelectronicsChemical vapor depositionPhotoconductivity

摘要: A series of devices with the structure GaAs/GaAs1−xNx/GaAs and 0.01

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