Reactor lid assembly for vapor deposition

作者: Roger Hamamjy , Andreas G. Hegedus , Gregg Higashi , Khurshed Sorabji , Gang He

DOI:

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摘要: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly is provided which includes first showerhead and an isolator disposed next each other on support, second exhaust wherein between assemblies assembly.

参考文章(62)
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Karl A. Littau, Ken Kaung Lai, Bevan Vo, Son N. Trinh, Salvador P. Umotoy, Bo Zheng, Ping Jian, Anzhong Chang, Siqing Lu, Chien-Teh Kao, Showerhead with reduced contact area ,(2000)