作者: Roger Hamamjy , Andreas G. Hegedus , Gregg Higashi , Khurshed Sorabji , Gang He
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摘要: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly is provided which includes first showerhead and an isolator disposed next each other on support, second exhaust wherein between assemblies assembly.