Vapor deposition reactor system

摘要: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor is provided which includes lid assembly disposed on body and containing first showerhead assembly, an isolator second exhaust consecutively linearly next each other support. The further contains faceplates opposite ends body, wherein between faceplate faceplate. has wafer carrier track lamp below plurality lamps may be utilized heat wafers carrier.