Composition-control of magnetron-sputter-deposited (BaxSr1−x)Ti1+yO3+z thin films for voltage tunable devices
作者： Jaemo Im , O. Auciello , P. K. Baumann , S. K. Streiffer , D. Y. Kaufman
DOI: 10.1063/1.125839
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摘要: Precise control of composition and microstructure is critical for the production (BaxSr1−x)Ti1+yO3+z (BST) dielectric thin films with large dependence permittivity on electric field, low losses, high electrical breakdown fields that are required successful integration BST into tunable high-frequency devices. Here, we present results composition-microstructure-electrical property relationships polycrystalline produced by magnetron-sputter deposition, appropriate microwave millimeter-wave applications such as varactors frequency triplers. Films controlled compositions were grown from a stoichiometric Ba0.5Sr0.5TiO3 target background processing gas pressure. It was determined (Ba+Sr)/Ti ratios these could be adjusted 0.73 to 0.98 changing total (Ar+O2) process pressure, while O2/Ar ratio did not strongly affect metal ion composition. Film crystalline structure properties ...
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sci-hub.se 参考文章(17)
J. D. Baniecki, R. B. Laibowitz, T. M. Shaw, P. R. Duncombe, D. A. Neumayer, D. E. Kotecki, H. Shen, Q. Y. Ma, Dielectric relaxation of Ba0.7Sr0.3TiO3 thin films from 1 mHz to 20 GHz Applied Physics Letters. ,vol. 72, pp. 498- 500 ,(1998) , 10.1063/1.120796
Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Jiro Naka, Akimasa Yuuki, Noboru Mikami, Kouichi Ono, Step Coverage and Electrical Properties of (Ba, Sr)TiO3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)2 Japanese Journal of Applied Physics. ,vol. 33, pp. 5129- 5134 ,(1994) , 10.1143/JJAP.33.5129
A.B. Kozyrev, V.N. Keis, G. Koepf, R. Yandrofski, O.I. Soldatenkov, K.A. Dudin, D.P. Dovgan, Procedure of microwave investigations of ferroelectric films and tunable microwave devices based on ferroelectric films Microelectronic Engineering. ,vol. 29, pp. 257- 260 ,(1995) , 10.1016/0167-9317(95)00156-5
P. C. Van Buskirk, J. F. Roeder, S. Bilodeau, Manufacturing of perovskite thin films using liquid delivery MOCVD Integrated Ferroelectrics. ,vol. 10, pp. 9- 22 ,(1995) , 10.1080/10584589508012259
K. Koguchi, T. Matsumoto, T. Kawai, Atomic-Scale Images of the Growth Surface of Ca1-xSrxCuO2 Thin Films Science. ,vol. 267, pp. 71- 73 ,(1995) , 10.1126/SCIENCE.267.5194.71
K. Tanabe, D. K. Lathrop, S. E. Russek, R. A. Buhrman, Epitaxial Y‐Ba‐Cu‐O thin films on MgO deposited by high‐pressure reactive magnetron sputtering Journal of Applied Physics. ,vol. 66, pp. 3148- 3153 ,(1989) , 10.1063/1.344151
F. A. Miranda, F. W. Van Keuls, R. R. Romanofsky, G. Subramanyam, Tunable Microwave Components for Ku- and K-Band Satellite Communications Integrated Ferroelectrics. ,vol. 22, pp. 269- 278 ,(1998) , 10.1080/10584589808208048
S. K. Streiffer, Cem Basceri, C. B. Parker, S. E. Lash, Angus I. Kingon, Ferroelectricity in thin films: The dielectric response of fiber-textured (BaxSr1−x)Ti1+yO3+z thin films grown by chemical vapor deposition Journal of Applied Physics. ,vol. 86, pp. 4565- 4575 ,(1999) , 10.1063/1.371404
G. K. Wehner, Sputtering of multicomponent materials Journal of Vacuum Science and Technology. ,vol. 1, pp. 487- 490 ,(1983) , 10.1116/1.571911
Shintaro Yamamichi, Hisato Yabuta, Toshiyuki Sakuma, Yoichi Miyasaka, (Ba+Sr)/Ti ratio dependence of the dielectric properties for (Ba0.5Sr0.5)TiO3 thin films prepared by ion beam sputtering Applied Physics Letters. ,vol. 64, pp. 1644- 1646 ,(1994) , 10.1063/1.111818