SUB-MICRON PATTERNING TITANIUM NITRIDE BY FOCUSED ION-BEAM TECHNIQUE
作者： JIANXIA GAO , MARY B. CHAN-PARK , DONGZHU XIE , BRYAN K. A. NGOI , CHEE YOON YUE
DOI: 10.1142/S1465876303001617
关键词:
摘要: Titanium nitride (TiN) thin films have low electrical resistivity, good chemical and metallurgical stability, exceptional mechanical properties. As such, we are interested in exploring TiN for use as mold material micro-and nano replication. Focused ion beam (FIB) technique was successfully used to fabricate sub-micron sized pattern on a TiN/Si(100) wafer. This mask-free fabrication takes advantage of the kinetic precision FIB; energy ions 40 KeV. The width depth each trench 390 nm 280 respectively.
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