The growth and morphology of epitaxial multilayer graphene

作者: J Hass , W A de Heer , E H Conrad

DOI: 10.1088/0953-8984/20/32/323202

关键词:

摘要: The electronic properties of epitaxial graphene grown on SiC have shown its potential as a viable candidate for post-CMOS electronics. However, progress in this field requires detailed understanding both the structure and growth graphene. To that end, review will focus current state research it relates to SiC. We pay particular attention similarity differences between two polar faces, (0001) , hexagonal Growth techniques, subsequent morphology graphene/SiC interface stacking order are reviewed discussed. Where possible relationship film also be reviewed.

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